The 6000 HPS system is comprised of stainless steel, double-wall, water-cooled, 30” x 36” process chamber mounted on a stainless steel frame, plasma torch, RF power generator and matching network, substrate manipulator, pumps, gauging, process control system, all integrated and tested as a complete unit.
This is an exceptional plasma spray system that will positively contribute to your unique project.
The RF/DC-ICP torch is mounted on top of the chamber. The plasma is generated from a gas mixture is comprised of 4 gasses that sprays around a cathode and through an anode. An arc ignites the plasma.
Deposition material can be introduced into the plasma jet as powder or liquid. When the liquid is used nanostructured coatings or deposits are formed with a wide variety of material compositions.
Substrate manipulation includes 6-axis of motion, high-speed substrate rotation and heating to 600° C.
A four gas distribution system consists of mass flow controllers, 20 slm range, MFC power supply/LCD display, inlet and purge valves and stainless steel gas manifold.
The chamber is pumped by a combination of a dry screw vacuum pump and a rotary booster pump complete with water-cooled foreline trap, air filter, throttling valve. Vacuum measurement is comprised of a capacitance manometer and Pirani/Piezo Transducer.
A PLC/PC based vacuum process automation system controls the pump-down and plasma deposition process. The system is user friendly with safety and process interlocks as required.
Detailed specifications and technical data is available on request. The system is modular in design and can be adapted to suit exact customer requirements in their laboratory or innovative research and design facility.